Low metal ion dispersant for CMP slurry

This Kabasph series of additives is developed for electronic polishing liquid systems, including CMP slurries, metal polishing fluids, oxide polishing fluids, and other precision polishing applications. Our KBS sereis Additives focuse on excellent suspension stability, viscosity reduction effect, and alkali resistance for abrasive particles. The portfolio covers block acrylates, modified block polymers, block copolymers, and organic polyurea suspending agents.